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Atomic Layer Deposition - Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen & Arthur Sherman

By Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen & Arthur Sherman

Release Date: 2013-05-17

Genre: Engineering

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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Atomic Layer Deposition - Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen & Arthur Sherman

By Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen & Arthur Sherman

Release Date: 2013-05-17

Genre: Engineering

(0 ratings)
Read Download
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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Atomic Layer Deposition

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